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19/02/2007 - Semicon China 2007
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Semicon China 2007- Shanghai New International Expor Center (SNIEC)

March 21st -23rd, 2007

Solvay Fluor will present the environmentally safe critical etch gas Sifren®, which is successfully tested in 65 nm node.

Further more the environmental friendly cleaning gas F2 as gas mixtures to purify CVD chambers from deposited residues.

Sulphur hexafluoride as the commercial advantageous cleaning gas especially for TFT-LCD production.

In addition to these gases Solvay Fluor supplies Hydrofluoric Acid high purity and Ammonium Fluoride electronic grade for the wet cleaning process.

We will be pleased to welcome you to our booth 3355 in Hall E3 in the Shanghai New International Expo Center (SNIEC)


Contacts for more info
  

michael.pittroff@solvay.com

 




 
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